Low temperature plasma synthesis of silicon nanocrystals for photonic applications
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Low temperature plasma deposition of silicon thin films: From amorphous to crystalline
We report on the epitaxial growth of crystalline silicon films on (100) oriented crystalline silicon substrates by standard plasma enhanced chemical vapor deposition at 175 °C. Such unexpected epitaxial growth is discussed in the context of deposition processes of silicon thin films, based on silicon radicals and nanocrystals. Our results are supported by previous studies on plasma synthesis of...
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تاریخ انتشار 2011